Project Z1( E):
(2011 - 2015)

Integration and nanopatterning techniques

Future information technology will be based on structures prepared with precision on the nanometer scale, so nanoscale defect engineering will become a necessity. This project aims at the preparation of appropriate structures like vertically arranged resistively switching cells utilizing oxides and higher chalcogenides by the use of advanced nanoscale patterning methods, such as e-beam, nanoimprint and XUV-IL. The use of ultra-high resolution nanostructuring techniques, as well as high-precision thin film analysis will allow studying ultimate scaling limits of the nanoswitching arrays and analysing and controlling defects formation and its effect on performance. The results will support the investigations performed in projects A2, B1, and C2.

Principal investigators:

Prof. Dr. rer. nat. D. Grützmacher
Peter Grünberg Institut (PGI-9)
Forschungszentrum Jülich GmbH
Phone: +49 (0)2461 61 2340

Dr. rer. nat. L. Juschkin
Lehr- und Forschungsgebiet Experimentalphysik des Extrem-Ultraviolett (EUV)
RWTH Aachen University
Phone: +49 (0)241 89 06313

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